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摘要在过去的二十年中,系统地开发二氧化硅微孔介孔材料无论是基础科学还是先进技术都已成为一个很有意义的挑战。在本文中，我们采用奥斯特瓦尔德熟化的方法制备中空二氧化硅，研究反应温度、反应时间及硅源用量等反应条件对制备中空二氧化硅的影响。本实验以原硅酸四乙酯为硅源，加入CTAB做表面活性剂，设定反应温度为90、100、150、180℃，反应时间为10、13、16h，硅源用量为0.5、1.0、1.5、2.4ml，对不同条件下所制得的样品进行表征。33860
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当浓度、温度不变时，反应时间越长，衍射峰强度越低，峰所在角度越大；浓度、时间不变时，随温度升高，随着温度升高，衍射峰的强度变大，衍射峰所在角度及介孔孔径变化无明显规律；温度、时间不变时，随硅源用量变大，峰所在角度变大，有序孔孔径基本不变。
结果表明，硅源用量为1.0ml，反应温度为150℃，反应时间为16h是反应的最佳条件。
关键词 介孔二氧化硅，奥斯瓦尔德熟化，中空结构
毕业论文设计说明书外文摘要
Title Synthesis and Characterization of Hollow SiO2
Abstract
Over the past two decades, systematic development of preparative methodology for silica (SiO2) based micro and mesoporous materials has become a significant challenge for both fundamental science and advanced technology. In this work, we employed the method of Ostwald ripening to fabricate porous hollow SiO2 spheres. The reaction conditions such as reaction temperature, reaction time and dosage of silica source were investigated. TEOS was used as silicon source and CTAB as surfactant. Samples were fabricated at the temperature of 90、100、150、100 ℃, reaction time of 10、 13、16 h, dosage of silica source 0.5、1.0、 1.5 、2.4 ml. The resultant samples were characterized.
When the concentration and temperature are unchanged, the reaction time is longer, the lower the intensity of the diffraction peak, the greater the angle where the peak; when the concentration and reaction time are unchanged, temperature is increasing, as the temperature increases, the intensity of the diffraction peak becomes strong, angle diffraction peak is located and the change in pore size mesoporous is not significant law; when temperature and reaction time are constant, the angle where the peak becomes larger, but ordered pore size is unchanged with the silicon source with a large amount.
The results showed that optimum reaction conditions is the amount of the silicon source 1.0ml, the reaction temperature was 150 ℃, the reaction time was of 16h.
Keywords mesoporous silica, Ostwald ripening, hollow spheres
目 次
1 前言 1
1.1 中空微球 1
1.1.1 在催化剂领域中的应用 1
1.1.2 在生物医学中的应用 2
1.1.3 在填料方面的应用 2
1.2 中空二氧化硅 3
1.3 中空微球的制备方法 4
1.3.1 软模板法 4
1.3.2 牺牲模板法 4
1.3.3 硬模板法 5
1.3.4 无模板法 5
2 实验部分 7
2.1 中空二氧化硅的合成 7
2.1.1 药品与仪器 7
2.1.2 实验操作步骤 7
2.1.3 实验样品标号及反应条件 8
2.2 中空二氧化硅的表征 9
2.2.1 XRD 9
2.2.2 TEM 9
3 表征分析 10
3.1 XRD分析 10
3.1.1 原硅酸四乙酯用量对实验的影响 10