摘要本课题利用热丝化学气相沉积法(HFCVD)在硅衬底上制备了两种不同硼掺杂浓度的金刚石薄膜,并通过沉积Ag叉指电极分别制备出两种不同硼掺杂浓度的金刚石紫外探测器。实验通过在氩气、700℃下退火1小时来实现探测器的欧姆接触,并对欧姆接触的探测器进行明暗电流-电压曲线测量和紫外光谱响应测试。测试结果表明,探测器的明暗电流电压曲线没有产生明显差异,探测器的响应度并未随硼掺杂浓度增加而增大,低掺杂浓度的金刚石薄膜制备出的紫外探测器在250nm处产生光响应,但响应强度较小,如何进一步提高特定波长下的响应度仍有待探究。32980
关键词 硼掺杂 金刚石 热丝化学气相沉积 光电探测器 紫外光谱响应
毕业论文设计说明书外文摘要
Title CVD Preparation and Structure Characterization of Diamond Films
Abstract
We prepared two boron-doped diamond films with different concentrations on a silicon substrate by hot filament chemical vapor deposition (HFCVD).Two diamond UV detectors were derived by depositing Ag interdigital electrodes on these two boron-doped diamond films respectively, named D1,D2. The ohmic contact of the detector was realized by annealing these two devices in Ar at 700℃ for 1 hour. The I-V curves of the detectors under dark and UV illumination were measured respectively as well as the UV responsivity spectra. The results indicated that the I-V curves of the detectors under dark and UV illumination didn’t show significant differences, and the responsivity of the detectors didn’t increased with the boron dopant concentration. Diamond UV detector with a low dopant concentration show a slight responsivity at 250 nm illumination, how to further improve the responsivity under a specific wavelength is yet to be explored.
Keywords boron-doped diamond HFCVD photodetectors UV responsivity
目 次
1 绪论 1
1.1 金刚石简介 1
1.2 金刚石薄膜的性能及应用 2
1.2.1 金刚石薄膜的力学、声学性能及其应用 3
1.2.2 金刚石薄膜的热学性能及其应用 3
1.2.3金刚石薄膜的光学性能及其应用 3
1.2.4金刚石薄膜的电学性能及其应用 3
1.3 CVD金刚石薄膜的制备技术 3
1.3.1 热丝辅助化学气相沉积法(HFCVD) 3
1.3.2 微波等离子CVD 3
1.3.3 等离子体射流(plasma jet)法 3
1.4 金刚石薄膜在光电探测领域的研究进展 3
1.4.1 金刚石薄膜用作光电探测器的优势 3
1.4.2金刚石薄膜紫外探测器性能提高方向 3
1.4.3 金刚石薄膜紫外探测器的不足 3
2 实验 3
2.1 硼掺杂纳米金刚石薄膜的制备 3
2.1.1 实验设备 3
2.1.2 薄膜预形核 3
2.1.3 薄膜沉积实验 3
2.2 金刚石紫外探测器的制备 3
2.2.1 电极制备 3
2.2.2 器件后处理 3
2.3 实验结果表征 3
2.3.1 扫描电子显微镜(SEM 3
2.3.2 光学显微镜 3
2.3.3 拉曼光谱(Raman Spectroscopy) 3
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